Sales Manager: Andrea
Email: Andrea@tmaxlaboratory.com
Wechat: 18250801164
RF Power Supply for PECVD
The PECVD system consists of a tube furnace, a quartz vacuum chamber, a vacuum system, a gas supply system, and a radio frequency power supply system. Mainly used for: growth of metal thin films, ceramic thin films, composite thin films, graphene, etc. It is easy to add functions, and can expand functions such as plasma cleaning and etching. The PECVD system has the advantages of high film deposition rate, good uniformity, high consistency and stability.
Main technical parameters of RF power supply:
|
Power output range |
0-500W |
|
Maximum reflected power |
200W |
|
working frequency |
RF:13.56MHZ±0.005% |
|
Power stability |
+/-0.1% |
|
Harmonic component |
≤-50dbc |
|
Rf region width |
0-600mmadjustable |
|
Matching way |
automatic |
|
Cooling mode |
Points of cold |
|
Noise |
<50dB |
|
Radio frequency interface |
50Ω N-type |
|
Input power |
208-240V 50/60HZ |
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.
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